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CVI Laser Optics反射鏡TLMB-800-45-1025
瀏覽次數(shù)：517發(fā)布日期：2024-03-16

產(chǎn)品介紹：

CVI反射鏡，是高質(zhì)量的光學(xué)反射鏡選擇，廣泛應(yīng)用于各類高功率及精密激光應(yīng)用中。鏡片面型精度、鍍膜損傷閾值高，堅固耐用并為客戶提供優(yōu)像質(zhì)。光學(xué)誤差RMS低于λ/50，表面粗糙度可達3-5?。

是目前國內(nèi)高校、研究所及高功率/高性能光學(xué)實驗室的選！

主要應(yīng)用:

l 激光諧振腔鏡

l 光路偏轉(zhuǎn)

l 各類激光加工設(shè)備

產(chǎn)品參數(shù)：

類別

系列代碼

波長范圍nm

反射率

直徑mm

面型精度

表面質(zhì)量

損傷閾值

窄帶部分反射鏡

PR1

190-2100

30-90%

12.7-50.8

λ/10

10-5

20 J/cm2, 20ns, 20Hz   at 1064nm,
10 MW/cm2 at 1064nm

窄帶可調(diào)全反鏡

TLM1

190-2100

R ≥ 99.0% at 0°
R ≥ 98.5% at 45°, P-Pol
R ≥ 99.0% at 45°, UNP
R ≥ 99.5% at 45°, S-Pol

12.7-101.6

λ/10

10-5

20 J/cm2, 20ns, 20Hz   at 1064nm,
10 MW/cm2 at 1064nm

光纖全反鏡

FLM

343, 515,

1030, 1064,
   1070, 1550nm

R ≥ 99.0% at 0°
R ≥ 99.0% at 45°, UNP

12.7-50.8

λ/10

10-5

20 J/cm2, 20ns, 20Hz   at 1064nm,
10 MW/cm2 at 1064nm

準(zhǔn)分子全反鏡

ARF

193

R ≥ 97% at 0°
R ≥ 96.0% at 45° UNP

25.4-76.2

λ/10

10-5

1 J/cm2, 20ns pulse at   193nm

KRF

248

R ≥ 99.5% at 0°
   R ≥ 99.0% at 45°, UNP

25.4-76.2

λ/10

10-5

3 J/cm2, 8ns pulse at   248nm

YAG全反鏡

Y5

213

R ≥ 97.0% at 0°
R ≥ 97.0% at 45°, UNP

12.7-50.8

λ/10

10-5

3 J/cm2, 8ns pulse at 248nm

Y4

262-266

R ≥ 99.9% at 0°
R ≥ 99.6% at 45°, P-Pol
R ≥ 99.8% at 45°, UNP
R ≥ 99.9% at 45°, S-Pol

12.7-101.6

λ/10

10-5

10 J/cm2, 20ns, 20Hz   at 266nm

Y3

349-355

R ≥ 99.9% at 0°
R ≥ 99.6% at 45°, P-Pol
R ≥ 99.8% at 45°, UNP
R ≥ 99.9% at 45°, S-Pol

12.7-101.6

λ/10

10-5

15 J/cm2, 20ns, 20Hz   at 355nm

Y2

523-532

R ≥ 99.9% at 0°
R ≥ 99.6% at 45°, P-Pol
R ≥ 99.8% at 45°, UNP
R ≥ 99.9% at 45°, S-Pol

12.7-101.6

λ/10

10-5

20 J/cm2, 20ns, 20Hz   at 532nm

Y1

1047-1064

R ≥ 99.9% at 0°
R ≥ 99.6% at 45°, P-Pol
R ≥ 99.8% at 45°, UNP
R ≥ 99.9% at 45°, S-Pol

12.7-101.6

λ/10

10-5

25 J/cm2, 20ns, 20Hz   at 1064nm

Y1S, Y2S, Y3S, Y4S

266, 355,

532, 1064

R ≥ 99.9% at 0°
R ≥ 99.9% at 45°, P-Pol
R ≥ 99.9% at 45°, S-Pol

25.4

λ/10

10-5

40 J/cm2, 20ns, 20Hz   at 1064nm

雙波長反射鏡

HM

1064/532

R ≥ 99% at 1064 and   532nm

12.7-50.8

λ/10

10-5

8 J/cm2, 20ns, 20Hz at   1064nm,
3 J/cm2, 20ns, 20Hz at 532nm

YH

1064/633

R ≥ 99% at 1064nm
R ≥ 80% at 633nm

25.4-50.8

λ/10

10-5

8 J/cm2, 20ns pulse at   1064nm

寬帶反射鏡

TLM2

450nm to 2100nm

R > 99.5% at 0° incidence
R >99.0% at 45° incidence

12.7-25.4

λ/10

10-5

500 mJ/cm2, 20ns, 20Hz   at 1064nm

MPQ

245 – 390 (UV)
   420 – 700 (VIS)

Ravg≥ 98% from 245 – 390nm at 0° - 45°
Ravg≥ 98% from 420 – 700nm at   0° - 45°

25.0

λ/4

60-40

0.5 J/cm2, 10ns at   532nm

鈦寶石超快反射鏡

TLMB

740 – 860

R > 99.0% from 740 – 860nm

25.0-101.6

λ/10

40-20

8 J/cm2, 300 ps, 20Hz   at 800nm

金屬鍍膜反射鏡

VUVA

157 – 190

R > 85% at 157nm by   design

25.4-50.8

λ/10

40-20

低功率應(yīng)用

DUVA

193 – 1200

R > 90% at 193nm
Ravg≥   85% at 400 – 1200nm

12.7-50.8

λ/10

40-20

PAUV

250 – 600

Ravg ≥ 85% (250 – 600nm)

12.7-76.2

λ/10

40-20

PAV

400 – 800

Ravg ≥ 87% (400 – 800nm)

12.7-76.2

λ/10

40-20

EAV

450 – 650

Ravg ≥ 92% (450 – 650nm)

12.7-76.2

λ/10

40-20

PS

400 – 20,000

Ravg ≥ 95% (400nm to   20 µm)

12.7-76.2

λ/10

40-20

PG

650 – 20,000

Ravg ≥ 95.5% (650 – 1700nm)
Ravg ≥ 98.0% (2 – 16 µm)

12.7-76.2

λ/10

40-20